Material Film for Secondary Batteries and Manufacturing Method Thereof

Crystallization of ALD Thin Films with Lithium Leakage Prevention via Heat Treatment Using Homologous Metal Barrier Sheets

This technology is a process for converting amorphous precursor films formed by atomic layer deposition into a crystalline structure. By covering the film with a barrier sheet containing the same metal components during heat treatment, it prevents the leakage of metals like lithium and the delamination of the substrate.

During the high-temperature heat treatment of amorphous material films, metal components often leak out, leading to degraded battery performance or film delamination from the substrate. Additionally, the formation of natural byproduct layers composed of carbon and oxygen compounds during transfer from the chamber to the furnace has historically increased interface resistance.

This technology involves depositing an amorphous film via an ALD process using metal precursors, then heat-treating it at 600°C or higher while covered with a barrier sheet containing the corresponding metal (e.g., lithium). This prevents compositional changes and delamination while removing natural byproduct layers to facilitate conversion into a crystalline structure. It can be applied to the manufacturing of cathode thin films for thin-film batteries, micro-batteries, and all-solid-state batteries, enabling the production of stoichiometric crystalline thin films with reduced interface resistance.

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Key Features:

• A step of forming a material film with an amorphous structure by providing a first metal precursor and a second metal precursor on a substrate
• A step of converting the amorphous structure into a crystalline structure by heat-treating the material film containing the first and second metals
• A step of heat-treating the material film after covering it with a barrier sheet
• A barrier sheet that reduces the leakage of the first metal from the material film during heat treatment

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