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Silica nanostructures, mesoscale assemblies comprising them, and methods for their manufacture

Listed on
2026-07-03
Silica Nanostructures with Hollow Frame Structures and Mesoscale Assemblies

This technology relates to silica nanostructures having a spherical or polyhedral hollow frame and an interior filling material, mesoscale assemblies comprising the same, and methods for manufacturing each.

Previously, it was difficult to precisely control the shape and surface curvature of amorphous phase materials at the nanoscale, which limited the diversity of usable materials.

This technology provides a method for manufacturing silica nanostructures with controllable surface curvature and shape, enabling the realization of various types of nanostructures and mesoscale assemblies assembled therefrom.

Key Features:
  • Silica nanostructures with spherical or polyhedral hollow frames
  • Internal filling structure containing a specific material
  • Manufacturing method capable of controlling surface curvature and shape
  • Mesoscale assemblies assembled from nanostructures and their manufacturing methods
Pohang University of Science & Technology
Insoo Lee | Niti Kumari | Jeonghoon Choi
Document
Date of application:
2022-04-04
|
Patent registration number:
10-2964614
Industry
advanced materials
chemicals
Technology
New materials
Chemistry
Country
Korea
Family Patent

N/A

Price
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