This technology concerns silica nanostructures, mesoscale assemblies incorporating them, their manufacturing methods, and the manufacturing methods for mesoscale assemblies that include these nanostructures. It is applicable to the micro/nano structural domain within advanced materials and chemistry.
Existing technologies are limited by their access to only a restricted number of crystalline phases, poor kinetic control, and a narrow range of post-synthesis structural modifications. This technology, therefore, proposes amorphous silica nanostructures that act as nanoscale amorphous phase materials, featuring controllable surface curvature, diverse shapes, forms, and internal structures, and comprising both a filled region and a hollow interior.
Accordingly, this technology's silica nanostructures feature a hollow frame, which has at least one spherical or polyhedral shape, and a filled region where a specific material is packed within the frame. These nanostructures offer controllable surface curvature, diverse shapes, forms, and internal structures. Consequently, the manufacturing method for mesoscale assemblies provides a significant advantage in producing mesoscale assemblies with the aforementioned benefits.
This technology was developed with project support from the Nanoscale-Spatially Confined Chemical Reactions Research Group of the National Research Foundation of Korea (NRF).
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